JPH0532468B2 - - Google Patents

Info

Publication number
JPH0532468B2
JPH0532468B2 JP62308428A JP30842887A JPH0532468B2 JP H0532468 B2 JPH0532468 B2 JP H0532468B2 JP 62308428 A JP62308428 A JP 62308428A JP 30842887 A JP30842887 A JP 30842887A JP H0532468 B2 JPH0532468 B2 JP H0532468B2
Authority
JP
Japan
Prior art keywords
substrate
vacuum
deposited
evaporation
ejection cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62308428A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01222045A (ja
Inventor
Shintaro Hatsutori
Takayuki Takahagi
Kei Ishitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINGIJUTSU JIGYODAN
Original Assignee
SHINGIJUTSU JIGYODAN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINGIJUTSU JIGYODAN filed Critical SHINGIJUTSU JIGYODAN
Priority to JP30842887A priority Critical patent/JPH01222045A/ja
Priority to US07/280,152 priority patent/US5007372A/en
Priority to EP88311500A priority patent/EP0319347B1/en
Priority to DE3850941T priority patent/DE3850941T2/de
Publication of JPH01222045A publication Critical patent/JPH01222045A/ja
Publication of JPH0532468B2 publication Critical patent/JPH0532468B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP30842887A 1987-12-04 1987-12-04 真空蒸着装置 Granted JPH01222045A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP30842887A JPH01222045A (ja) 1987-12-04 1987-12-04 真空蒸着装置
US07/280,152 US5007372A (en) 1987-12-04 1988-12-05 Vacuum depositing apparatus
EP88311500A EP0319347B1 (en) 1987-12-04 1988-12-05 Vacuum depositing apparatus
DE3850941T DE3850941T2 (de) 1987-12-04 1988-12-05 Vakuumbeschichtungsanlage.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30842887A JPH01222045A (ja) 1987-12-04 1987-12-04 真空蒸着装置

Publications (2)

Publication Number Publication Date
JPH01222045A JPH01222045A (ja) 1989-09-05
JPH0532468B2 true JPH0532468B2 (en]) 1993-05-17

Family

ID=17980933

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30842887A Granted JPH01222045A (ja) 1987-12-04 1987-12-04 真空蒸着装置

Country Status (1)

Country Link
JP (1) JPH01222045A (en])

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2655094B2 (ja) * 1994-08-30 1997-09-17 日本電気株式会社 電子銃蒸着装置
US6036821A (en) * 1998-01-29 2000-03-14 International Business Machines Corporation Enhanced collimated sputtering apparatus and its method of use
US7070697B2 (en) 2003-04-14 2006-07-04 Hitachi Global Storage Technologies Netherlands B.V. Methods of making a read sensor with use of a barrier structure for depositing materials

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6157907A (ja) * 1984-08-29 1986-03-25 Hitachi Cable Ltd イメ−ジガイド素線配列方法

Also Published As

Publication number Publication date
JPH01222045A (ja) 1989-09-05

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